Return Home
Paper Publications
采用射频磁控溅射法在Si (111) 衬底上生长β-Ga2O3 薄膜
Release Time:2019-04-14
  • Institution:
    物理学院
  • Journal:
    《功能材料》
  • First Author:
    肖洪地
  • All the Authors:
    马瑾,林兆军,Fujian Zong,Xijian Zhang,栾彩娜
  • Document Code:
    lw-73891
  • Volume:
    v 37
  • Issue:
    n SUPPL.
  • Page Number:
    1
  • Translation or Not:
    No
  • Date of Publication:
    2006-10
Copyright All Rights Reserved Shandong University Address: No. 27 Shanda South Road, Jinan City, Shandong Province, China: 250100
Information desk: (86) - 0531-88395114
On Duty Telephone: (86) - 0531-88364731 Construction and Maintenance: Information Work Office of Shandong University