Characterization of tunable band gap aluminum indium oxide films prepared on SiO2 (0001) by MOCVD
Release Time:2019-10-24
Hits:
- Institution:
- 集成电路学院
- Title of Paper:
- Characterization of tunable band gap aluminum indium oxide films prepared on SiO2 (0001) by MOCVD
- Journal:
- Journal of Materials Science: Materials in Electronics
- First Author:
- 马瑾
- All the Authors:
- 栾彩娜,马瑾
- Document Code:
- lw-178176
- Number of Words:
- 4
- Translation or Not:
- No
- Date of Publication:
- 2016-01
- Release Time:
- 2019-10-24