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Preparation and characterization of Al2xIn22xO3 films deposited on MgO (10 0) by MOCVD

Release Time:2019-10-24
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Institution:
集成电路学院
Title of Paper:
Preparation and characterization of Al2xIn22xO3 films deposited on MgO (10 0) by MOCVD
Journal:
Materials Research Bulletin
First Author:
马瑾
All the Authors:
冯先进,栾彩娜,马瑾
Document Code:
lw-171206
Number of Words:
4
Translation or Not:
No
Date of Publication:
2015-07
Release Time:
2019-10-24