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Preparation and characterization of Al2xIn22xO3 films deposited on MgO (10 0) by MOCVD

Release Time:2019-06-06
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Institution:
微电子学院
Title of Paper:
Preparation and characterization of Al2xIn22xO3 films deposited on MgO (10 0) by MOCVD
Journal:
Materials Research Bulletin
First Author:
马瑾
All the Authors:
栾彩娜,冯先进
Document Code:
lw-171206
Translation or Not:
No
Date of Publication:
2015-07
Release Time:
2019-06-06